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The information presented in this cross reference is based on TOSHIBA's selection criteria and should be treated as a suggestion only. Please carefully review the latest versions of all relevant information on the TOSHIBA products, including without limitation data sheets and validate all operating parameters of the TOSHIBA products to ensure that the suggested TOSHIBA products are truly compatible with your design and application.
Please note that this cross reference is based on TOSHIBA's estimate of compatibility with other manufacturers' products, based on other manufacturers' published data, at the time the data was collected.
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A reverse bias of VR causes the diffusion potential to increase by VR. Although electrons are the majority carriers in the n-type semiconductor and the minority carriers in the p-type semiconductor, the electron density of the p-type semiconductor becomes higher than that of the n-type semiconductor above the diffusion barrier, VD + VR (as opposed to the unbiased and forward-biased states). As a result, electrons, the minority carriers in the p-type semiconductor, diffuse into the n-type semiconductor. The amount of minority carrier diffusion that occurs under reverse bias is much smaller than that that occurs under forward bias. However, under reverse bias, electrons are injected into the p-type semiconductor to compensate for the diffusion while holes are injected into (i.e., electrons are drawn away from) the n-type semiconductor. Therefore, under reverse bias, current flows in the direction opposite to the one under forward bias. The reverse current is very low as it is due to minority carrier diffusion.